International Workshop on Science and Patents (IWP) 2013


The international workshop on Science and Patents (IWP) is an international workshop,which has been organised since 2011. IWP 2013 is the third anniversary IWP to commemorate the many contributions of Dr. Rafaël H. L. Kiebooms to the University of Tsukuba since his first visit in 1999. Dr. MBA. Kiebooms is an expert in the science of light emitting and conducting organic and polymer materials. He is qualified as a European patent attorney and presently works as a patent examiner at the European Patent Office in the Netherlands. During IWP 2013 interdisciplinary lectures and poster communications will be presented on topics concerning international patents, physics, chemistry, biology, and technologies for industry.

Invited Speakers
de SILVA A. Prasanna, Prof. Queens Univ., UK
KOIZUMI, Hiroyasu, Prof. University of Tsukuba, Japan
YODA, Satoshi, Dr. AIST, Japan
KIEBOOMS Rafaël H. L., Dr. European Patent Office,The Netherlands
MOCHIDA, Madoka KEK, Japan
NAKAO, Reiko, Dr. AIST, Japan
UCHIDA, Natsuko University of Tsukuba, Japan
KIHARA, Hideyuki, Dr. AIST, Japan
HIROKI, Kazuaki, Prof. Tsuyama National College of Technology, Japan
MORI, Takeshi, Dr. Industrial Tech. Center of Wakayama Prefecture, Japan
BUNZ, Uwe H. F., Prof. Ruprecht-Karls-Universität Heidelberg, Germany


September 6 th, 2013


University of Tsukuba (University Hall, 30th Anniversary Hall), Japan


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Registration fees are free for all participants, who registered his/her name and title, affiliation, and e-mail address by sending e-mail to goto[at] (change [at] to @) with a message subject of ‘IWP2013’.

Abstract and Proceedings

Abstract submission (deadline: July 31, 2013) is closed.

TICMS2013 proceeding will be electronically published in a category of
IOP Conference Series: Materials Science and Engineering   by IOP Publishing.
All invited and recommended speakers can submit a paper to the proceedings.

The maximum length of the manuscript is 8 pages for the invited speakers, and 6 pages for
the recommended speakers, respectively. Detailed information for authors is available in

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